Negative resist composition

The invention relates to a negative resist composition used for liquid crystal display, including adhensive resin comprising specific structure, multifunctional (methyl) acrylate monomer, photoinitiator and organic solvent. The negative resist composition has good UV transmittivity, film residua rat...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, HYU-JI, MOON, BONG-SEOK, KIM, HYO-JEONG, JEON, JI-HYEON, YANG, PIL-RYE, KIM, SEON-HO, JUNG, NAKIL, LEE, DONG-HWAN, KIM, JIN-KON
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a negative resist composition used for liquid crystal display, including adhensive resin comprising specific structure, multifunctional (methyl) acrylate monomer, photoinitiator and organic solvent. The negative resist composition has good UV transmittivity, film residua rate, pattern stability and excellent thermal stability and resistance to water. Therefore, the negative resist composition can be used for forming pattern for organic insulation film, red-green-blue color fliter, black matrix, shock insulator or UV protection layer of liquid crystal display.