Lithographic apparatus and device manufacturing method

In a lithographic projection apparatus, a slider 10 is provided for motion of the substrate table or mask table. The slider 10 is supported on a gas-bearing 14 and separates a region at atmospheric pressure from a vacuum space region. A differential pressure pump 16 is provided to maintain the press...

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Bibliographische Detailangaben
Hauptverfasser:	SCHNEIDER, RONALD MAARTEN, VIJFVINKEL, JAKOB
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	In a lithographic projection apparatus, a slider 10 is provided for motion of the substrate table or mask table. The slider 10 is supported on a gas-bearing 14 and separates a region at atmospheric pressure from a vacuum space region. A differential pressure pump 16 is provided to maintain the pressure difference in the presence of the gas-bearing 14. A pressure compensation vessel 20 is provided on top of the slider 10 and also contains a vacuum. Over most of the area of the slider 10, the pressure on its opposed first and second sides 22, 24 is the same and so deformation of the slider is avoided. The sidewalls 30 of the pressure compensation vessel 20 transmit the external gas pressure to the slider 10 such that they are in line with the forces of the gas-bearing 14.