Method and apparatus for embedded process control framework in tool systems

The present invention provides for a method and an apparatus for implementing an embedded process control into a manufacturing tool system. At least one semiconductor device is processed. An embedded process control procedure is performed in response to the processing of the semiconductor device. A...

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Bibliographische Detailangaben
Hauptverfasser:	TOPRAC, ANTHONY JOHN, COSS, ELFIDO JR
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	The present invention provides for a method and an apparatus for implementing an embedded process control into a manufacturing tool system. At least one semiconductor device is processed. An embedded process control procedure is performed in response to the processing of the semiconductor device. A subsequent process of semiconductor device is performed in response to the embedded process control procedure. The apparatus of the present invention comprises: a computer system; and at least one manufacturing tool system interfaced with the computer, the manufacturing tool system comprising an embedded process control system capable of receiving commands from the computer system and control a manufacturing process performed by the manufacturing tool system.