Apparatus and method for a light source for photolithography

A hybrid light source for photolithography is disclosed. According to an embodiment of the invention, a light source comprises, a head, a first set of poles coupled to the head, the first set of poles are located approximately at an outer edge of the head, and a second set of poles coupled to the he...

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Bibliographische Detailangaben
Hauptverfasser:	PADIYAR, SUSHIL D, YANG, HSUEN, LEE, EVERETT B
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A hybrid light source for photolithography is disclosed. According to an embodiment of the invention, a light source comprises, a head, a first set of poles coupled to the head, the first set of poles are located approximately at an outer edge of the head, and a second set of poles coupled to the head located between the outer edge and a center of the head. According to a further embodiment of the invention, the poles are adjustable to change the characteristics of the light source.