Method for producing extreme ultraviolet lithography substrates

A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a f...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	RUSSO, NIKKI JO, HRDINA, KENNETH EDWARD, WASILEWSKI, MICHAEL HENRY
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat porous EUV Lithography large dimension preform and consolidating the flat porous EUV Lithography large dimension preform into a flat dense EUV Lithography large dimension homogeneous glass body.