Method of forming oxidation resistant coating on conductive structure
A method for forming an oxidation resistant coating on a conductive structure is provided. A first photo-resist is utilized to form first patterned openings. Then, a second photo-resist is filled into the first patterned openings and developed to form second patterned openings. Afterwards, an oxidat...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method for forming an oxidation resistant coating on a conductive structure is provided. A first photo-resist is utilized to form first patterned openings. Then, a second photo-resist is filled into the first patterned openings and developed to form second patterned openings. Afterwards, an oxidation resistant coating is plated on the second patterned openings, and then the first photo-resist is removed. Finally, a portion of the metal layer is etched to form a patterned metal layer, i.e. the desired conductive structure, with the help of the mask formed by the second photo-resist and the oxidation resistant coating. |
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