Image sensor and method of fabricating the same

Image sensor and method of fabricating the same

An image sensor with optical guard rings is provided. The optical guard rings are embedded in a stacked inter-metal dielectric layer between the sensor areas, that is, around each pixel. The refraction index (RI) of the optical guard rings is smaller than that of the stacked inter-metal dielectric l...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: YANG, DUN-NIAN
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An image sensor with optical guard rings is provided. The optical guard rings are embedded in a stacked inter-metal dielectric layer between the sensor areas, that is, around each pixel. The refraction index (RI) of the optical guard rings is smaller than that of the stacked inter-metal dielectric layer. Therefore, the incident light with a large angle of incidence is blocked by the optical guard rings and cannot arrive at the adjacent pixels.