Continuous vacuum film deposition machine with built-in electrostatic dust removal mechanism

Continuous vacuum film deposition machine with built-in electrostatic dust removal mechanism

This invention relates to a continuous vacuum film deposition machine with built-in electrostatic dust removal mechanism, which comprises a cleaning region with a lifting structure installed therein, a feeding and depressurizing region with a gate at each end, in which one gate is connected to the c...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE, YUANI, LIAO, HSUEHIUNG, YU, TUAN-JEN, HUANG, TAI-YUAN, LIU, CHUNGUNG
Format: Patent
Sprache:eng
Schlagworte:
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:This invention relates to a continuous vacuum film deposition machine with built-in electrostatic dust removal mechanism, which comprises a cleaning region with a lifting structure installed therein, a feeding and depressurizing region with a gate at each end, in which one gate is connected to the cleaning region and the other gate is connected to the feeding and depressurizing region, a discharging and pressurizing region with a gate at each end, in which one gate is connected to a vacuum film deposition region, a material-retrieval and returning region connected to the discharging and pressurizing region with a lifting structure built therein, and a reflowing region connected to the returning region and the cleaning region with a transporting mechanism built therein.