Fabrication method of anisotropic conductive film and structure of the same

The anisotropic conductive film and the forming method thereof are disclosed. The method includes steps of (A) provide a nano-porous template and form the thin metal layer on its surface; (B) grow the nanowires into the nanochannel of the template; (C) removing the porous template; (D) forming a magnetic coating layer on the nanowires; (E) applying a magnetic field on the nanowires and forming a passivation layer between the nanowires; and (F) optionally removing the substrate; (G) forming electrodes by sputtering on the both side of the anisotropic conductive film.