Lateral polysilicon pin diode and method for so fabricating

The invention provides a PIN diode having a laterally extended I-region. The invention also provides a method of fabricating the inventive PIN diode compatible with modern RF technologies such as silicon-germanium BiCMOS processes.

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Bibliographische Detailangaben
Hauptverfasser: WALTER, KEITH M, GREENBERG, DAVID R, SUBBANNA, SESHARDRI, JADUS, DALE K
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:The invention provides a PIN diode having a laterally extended I-region. The invention also provides a method of fabricating the inventive PIN diode compatible with modern RF technologies such as silicon-germanium BiCMOS processes.