Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses

A longstroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and mov...

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Bibliographische Detailangaben
Hauptverfasser:	SOEMERS, HERMANUS MATHIAS JOANNES RENE, BISSCHOPS, THEODORUS HUBERTUS JOSEPHUS, RENKENS, MICHAEL JOZEFA MATHIJS, BOUWER, ADRIANUS GERARDUS, DRIESSEN, JOHANNES CORNELIS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A longstroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and moved by movement of the sliding seal. The sliding seal may be a plate, a bowl or a labyrinth of interleaved plates.