Method of making exposure device and equipment

A chemical filter is provided for eliminating the chemical pollution substance from gas and suppressing the temperature fluctuation of the gas to a designed range. It is disposed in the path of ventilation located between the air condition device stored in at least part of the mechanical chamber and the exposure equipment stored in the exposure main chamber. Therefore, the surrounding of the exposure equipment located at the downstream of chemical filter can maintain at a high clean chemical environment. The temperature fluctuation of the gas passed through the chemical filter can suppress to a designed range by using the air conditioner. That is to say, the disadvantage of the illuminant decrease owing to tarnish of optical components and the gas temperature fluctuation supplying to the exposure main chamber can suppress effectively.