A method for removing a metal oxide

The invention provides a method for removing a metal oxide. The invention method is for removing the metal oxide contained a titanium, a fluoride and a sulfide by a solution contained a hydroxylamine or hydroxylamine derivatives. The metal oxide produces on a surface after tungsten etch back process...

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Bibliographische Detailangaben
Hauptverfasser:	YANG, CHIHUN, YEH, TUNGIN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention provides a method for removing a metal oxide. The invention method is for removing the metal oxide contained a titanium, a fluoride and a sulfide by a solution contained a hydroxylamine or hydroxylamine derivatives. The metal oxide produces on a surface after tungsten etch back process.