An exposure system of photosensitive fibers and the method thereof
The present invention provides a two-beam interference exposure system can be simply adjusted by rotating only one mirror. By placing a half-wavelength wave plate in one of the interference arms and precisely scanning the relative fiber position, the present invention can expose true apodized fiber...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The present invention provides a two-beam interference exposure system can be simply adjusted by rotating only one mirror. By placing a half-wavelength wave plate in one of the interference arms and precisely scanning the relative fiber position, the present invention can expose true apodized fiber Bragg gratings in a single scan by simultaneously rotating the angle of the half-wavelength wave plate. By rotationally switching the fast and slow axes of the 1/2 wavelength wave plate, the present invention can also expose pi-phase-shifted fiber grating by the same system. |
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