Chemical liquid feeding apparatus

The present invention relates to a chemical liquid feeding apparatus, which can stably supply a chemical liquid at a reduced initial cost and maintenance cost. The chemical liquid feeding apparatus supplies a pressurization gas through a pressurization gas pipeline to a pressurization container, and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NAGATA, AKIRA, KATAGIRI, TAKAAKI, NAKASHIMA, KAZUSHI, ADACHI, DAISUKE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a chemical liquid feeding apparatus, which can stably supply a chemical liquid at a reduced initial cost and maintenance cost. The chemical liquid feeding apparatus supplies a pressurization gas through a pressurization gas pipeline to a pressurization container, and through an auxiliary pressurization gas to the pressurization container. After pressurization of the auxiliary pressurization pipeline, the pressurization gas is fed through the pressurization gas pipeline to the pressurization container, and pressurizes a chemical liquid. The pressurized transportation of the chemical liquid to the pressurization container is controlled by a switching operation according to the measurement from a gas flow meter 3.