Method of fabricating floating gate
A fabricating method of a floating gate is described. A substrate having patterned a liner layer and a mask layer thereon and a trench therein is provided. A tunnel oxide is formed on the surface of the trench. A conductive layer is filled in the trench. An etching step is performed to form a first...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!