Method of fabricating floating gate
A fabricating method of a floating gate is described. A substrate having patterned a liner layer and a mask layer thereon and a trench therein is provided. A tunnel oxide is formed on the surface of the trench. A conductive layer is filled in the trench. An etching step is performed to form a first...
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| Sprache: | eng |
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| Zusammenfassung: | A fabricating method of a floating gate is described. A substrate having patterned a liner layer and a mask layer thereon and a trench therein is provided. A tunnel oxide is formed on the surface of the trench. A conductive layer is filled in the trench. An etching step is performed to form a first floating gate and a second floating gate on the sidewalls of the trench, wherein top corners of the first floating gate and the second floating gate are sharp profile. |
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