Carbon film and method for formation thereof and carbon film coated article and method for preparation thereof

Carbon film and method for formation thereof and carbon film coated article and method for preparation thereof

A carbon film containing fluorine and hydrogen, wherein a spectrum determined by FT-IR (Fourier transform infrared) spectrum analysis exhibits such a relationship that a ratio (IR.C-F)/(IR.C-H) between a peak area (IR.C-F) in a range from 1000 cm to 1300 cm resulting from C-F bonds and a peak area (...

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Bibliographische Detailangaben
Hauptverfasser: TAKEUCHI, JO, MURAKAMI, YASUO, NAKAHIGASHI, TAKAHIRO
Format: Patent
Sprache:eng
Schlagworte:
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:A carbon film containing fluorine and hydrogen, wherein a spectrum determined by FT-IR (Fourier transform infrared) spectrum analysis exhibits such a relationship that a ratio (IR.C-F)/(IR.C-H) between a peak area (IR.C-F) in a range from 1000 cm to 1300 cm resulting from C-F bonds and a peak area (IR.C-H) in a range from 2800 cm to 3100 cm resulting from C-H bonds is larger than 0, and a spectrum determined by XPS (X-ray photoelectron spectrum analysis) exhibits such a relationship that a ratio (F1S/C1S) between a peak intensity resulting from F1S and a peak intensity resulting from C1S is larger than 0 and smaller than 3. A carbon film containing hydrogen and nitrogen. A carbon film containing at least one of metal, metal compound, silicon and silicon compound.