Method for manufacturing auxiliary gas-adding polyurethane/polyurethane-urea polishing pad

A method for manufacturing a PU (polyurethane) polishing pad is provided. Resins containing active hydrogen functional groups such as polyol resins, polyamine resins, and polythiol resins, and polyisocyanate resins containing -NCO functional groups are mixed to form a foamed PU polishing pad with ex...

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Bibliographische Detailangaben
Hauptverfasser:	JU, MING-GUEI, SHR, WENANG, CHEN, WEN-BIN, WEI, LUNGNG, JANG, YUNG-JUNG
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	A method for manufacturing a PU (polyurethane) polishing pad is provided. Resins containing active hydrogen functional groups such as polyol resins, polyamine resins, and polythiol resins, and polyisocyanate resins containing -NCO functional groups are mixed to form a foamed PU polishing pad with excellent polishing properties by reaction injection-molding under high pressure, low temperature and auxiliary gas-adding. The PU polishing pad in accompany with the abrasive slurry can be widely used to polish high-level products such as wafers and optical glass.