Method and device for the production of process gases

This invention relates to a production of process gas, which can produce hydrogen containing gas made from water vapor and hydrogen with simple procedure and low cost, in which the mixing ratio of water vapor and hydrogen can be controlled accurately and the rework process can be performed. This inv...

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Bibliographische Detailangaben
Hauptverfasser:	SOMMER, HELMUT, ERLIKH, GENRIH, ROTERS, GEORG DR, MADER, ROLAND, PASHUT, YEHUDA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING METHODS OF STEAM GENERATION SEMICONDUCTOR DEVICES STEAM BOILERS STEAM GENERATION WEAPONS
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Beschreibung
Zusammenfassung:	This invention relates to a production of process gas, which can produce hydrogen containing gas made from water vapor and hydrogen with simple procedure and low cost, in which the mixing ratio of water vapor and hydrogen can be controlled accurately and the rework process can be performed. This invention provides a method and a device for producing process gas, which is used for treating a substrate, especially a semiconductor substrate, in which oxygen is burned in a combustion chamber under a hydrogen-rich environment to form the process gas made from water vapor and hydrogen.