Silicon oxide film

The present invention relates to a silicon oxide film formed on the surface of a plastic substrate, characterized in that in vicinity of the interface between it and the plastic substrate, methyl and methylene groups exist. Said silicon oxide film not only has good adhesion to the plastic substrate,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KOBAYASHI, AKIRA+, KURASHIMA, HIDEO, IEKI, TOSHIHIDE, INAGAKI, HAJIME, NAMIKI, TSUNEHISA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	The present invention relates to a silicon oxide film formed on the surface of a plastic substrate, characterized in that in vicinity of the interface between it and the plastic substrate, methyl and methylene groups exist. Said silicon oxide film not only has good adhesion to the plastic substrate, softness and flexibility, but also has superior gas barrier property. As compared with the conventional, gas barrier property can be obtained by a relatively small film thickness and the productivity is excellent.