Method for a plan-view transmission electron microscopy sample preparation technique for via and contact characterization

A method for preparing a transmission electron-microscopy (TEM) sample for contact and via characterization. Specifically, one embodiment of the present invention discloses a method where an integrated circuit semiconductor chip (IC chip) is bonded to a piece of glass and attached to a sample holder...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DAI, JIYAN, TAY, CHUI-LAM, REDKAR, SHAILESH, ER, EDDIE, TEE, SIAM-FOONG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method for preparing a transmission electron-microscopy (TEM) sample for contact and via characterization. Specifically, one embodiment of the present invention discloses a method where an integrated circuit semiconductor chip (IC chip) is bonded to a piece of glass and attached to a sample holder. Areas of the IC chip are removed by polishing until a region surrounding a particular contact or via is exposed. The piece of glass supports the IC chip during the polishing process. The IC chip is cut using a focused ion beam to create a thin membrane suitable for TEM failure analysis. The thin membrane includes a plan-view cross-section from the particular contact or via. The cross-sectional plan-view is perpendicular to the longitudinal axis of the contact or via.