Apparatus and method of holding mask, and exposure apparatus

A kind of mask holding apparatus capable of preventing the held mask from being bent and alleviating curvature of mask pattern image surface is disclosed in the present invention. The mask holding apparatus (1) holds a mask (M) including the first and the second pattern regions (PT1, PT2) to be tran...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	YOSHIKAWA, YUUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A kind of mask holding apparatus capable of preventing the held mask from being bent and alleviating curvature of mask pattern image surface is disclosed in the present invention. The mask holding apparatus (1) holds a mask (M) including the first and the second pattern regions (PT1, PT2) to be transferred on a substrate. Moreover, this mask holding apparatus (1) comprises a support means (3) for supporting the mask M with the region sandwiched by the first pattern region (PT1) and the second pattern region (PT2), and a supporting position adjusting means (18) for adjusting the position to support the mask (M) of the support means (3).