Method of production using fluorosilicate glass as inter-metal dielectric layer

Method of production using fluorosilicate glass as inter-metal dielectric layer

A method of production using fluorosilicate glass as a inter-metal dielectric layer comprises: using a high density plasma chemical vapor deposition having a good filling capacity to deposit a first fluorosilicate glass layer on a metal wire layer which substantially fills up the opening of the meta...

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Bibliographische Detailangaben
Hauptverfasser: WU, SZU-AN, WANG, H-L, CHENG, WEN-KUNG, YOO, MING-HWA+, CHENG, YI-LUNG
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method of production using fluorosilicate glass as a inter-metal dielectric layer comprises: using a high density plasma chemical vapor deposition having a good filling capacity to deposit a first fluorosilicate glass layer on a metal wire layer which substantially fills up the opening of the metal wire layer; and using a plasma enhanced chemical vapor deposition to deposit a second fluorosilicate glass layer.