Film forming unit

The present invention is a film forming unit for forming a film on a substrate by supplying a coating solution on the substrate from a discharge nozzle, including moving means for moving the discharge nozzle, wherein the moving means comprises a supporting member for supporting the discharge nozzle, a moving member for moving the supporting member, a guide shaft passing through bearing portion which is formed in the supporting member, and an air supply mechanism for supplying air to a space between the bearing portion and the guide shaft. The discharge nozzle discharges the coating solution while moving along the guide shaft. On the substrate the coating solution is applied along the locus of the discharge nozzle movement. Since air is supplied to the space between the bearing portion and the guide shaft, the supporting member can be made to be in the state of floating relative to the guide shaft. Therefore, since there is no mechanical contact between the bearing portion and the guide shaft, little slide resistance occurs. As a result, even if the discharge nozzle moves at a high speed, the vibration caused by the slide resistance can be restrained, whereby the discharge of the coating solution is prevented from being disturbed so that the predetermined coating of the coating solution is performed precisely.