Process for recovery of synthetic resin substrate and pressured type cleaning apparatus used thereof

The present invention relates to a method of removing a layer of material from a synthetic resin or an organic add ester of cellulose comprising: washing the layer from the substrate with an aqueous alkali solution having a temperature of at least 105 DEG C, and then washing the alkali solution from...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: NAKAZAWA, AKIRA+, YAMAGUCHI, MASATOSHI, KISHI, KYOICHI, KIKUKAWA, TAKAHITO, TUYUKI, YOSHIHIRO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!