Process for recovery of synthetic resin substrate and pressured type cleaning apparatus used thereof

The present invention relates to a method of removing a layer of material from a synthetic resin or an organic add ester of cellulose comprising: washing the layer from the substrate with an aqueous alkali solution having a temperature of at least 105 DEG C, and then washing the alkali solution from...

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Bibliographische Detailangaben
Hauptverfasser: NAKAZAWA, AKIRA+, YAMAGUCHI, MASATOSHI, KISHI, KYOICHI, KIKUKAWA, TAKAHITO, TUYUKI, YOSHIHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a method of removing a layer of material from a synthetic resin or an organic add ester of cellulose comprising: washing the layer from the substrate with an aqueous alkali solution having a temperature of at least 105 DEG C, and then washing the alkali solution from the substrate. Furthermore, the present invention relates to a pressure vessel comprising a longitudinal cylindrical body having a circular cross-section, an end plate connected to the top of the cylindrical body and an inverted end plate connected to the lower part of the cylindrical body in a manner such that its convex part faces upwards wherein the pressure vessel has a strainer plate and a stirring blade inside the cylindrical body.