Engineered polishing pad for improved slurry distribution

Engineered polishing pad for improved slurry distribution

The present invention provides a polishing pad and a method for manufacturing the polishing pad; the polishing pad comprising a polishing body having a polishing surface and a plurality of nonconcentric fossae formed in the polishing surface and having a geometric shape. In one embodiment, the geome...

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Hauptverfasser: MICELI, FRANK, MERCHANT, SAILESH MANSINH, MAZE, JOHN ALBERT III, EASTER, WILLIAM GRAHAM, CREVASSE, ANNETTE MARGARET
Format: Patent
Sprache:eng
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DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
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creator MICELI, FRANK
MERCHANT, SAILESH MANSINH
MAZE, JOHN ALBERT III
EASTER, WILLIAM GRAHAM
CREVASSE, ANNETTE MARGARET
description The present invention provides a polishing pad and a method for manufacturing the polishing pad; the polishing pad comprising a polishing body having a polishing surface and a plurality of nonconcentric fossae formed in the polishing surface and having a geometric shape. In one embodiment, the geometric shape is a circle. The geometric shape, in an alternative embodiment, is a polygon. In a particularly advantageous embodiment, the polygon is a hexagon.
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subjects DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
title Engineered polishing pad for improved slurry distribution
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