Automatic fluorine control system

An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F2 ""sweet spot"" in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines E/ V, th...

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Bibliographische Detailangaben
Hauptverfasser:	GONG, MENGXIONG, BINDER, MICHAEL C, CARLESI, JASON R, DAS, PALASH P
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F2 ""sweet spot"" in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines E/ V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on E/ V without the need to actually measure the fluorine concentration.