Method for extracting positioning image

The purpose of the present invention is to provide a technique of exactly recognizing the boundary between a photomask substrate and a shielding material and displays the same, and thereby realizing correction of a defect on the photomask based on the exact position recognition. Specifically, inform...

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Bibliographische Detailangaben
1. Verfasser:	AITA, KAZUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a technique of exactly recognizing the boundary between a photomask substrate and a shielding material and displays the same, and thereby realizing correction of a defect on the photomask based on the exact position recognition. Specifically, information on the difference between an image detection signal (pixel) in every matrix-like scanning position (dot), and another image detection signal in the peripheral scanning position is collected and the maximum or minimum of the values over zero from the difference information is employed as new image information about the scanning position is collected, so that a wanted part in the image such as the contour of a pattern of a point hole or a continuous boundary portion of an isolated area is displayed.