Wafer processing reactor system with programmable processing parameters and method

A wafer processing reactor system for processing semiconductor wafers is provided. The system includes a controller which responds to recipe steps, each step having a duration of time Trecipe, and controls a plurality of process parameters within the reactor. The controller is configured to provide...

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Bibliographische Detailangaben
Hauptverfasser:	OTAGURO, CURTIS M, YOUNG, LYDIA J., TRACEY, TAMI J, DAVIDSON, DONALD W, PUTNAM-PITE, DOUGLAS V
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A wafer processing reactor system for processing semiconductor wafers is provided. The system includes a controller which responds to recipe steps, each step having a duration of time Trecipe, and controls a plurality of process parameters within the reactor. The controller is configured to provide control signals to change the value of the process parameters at a plurality of time intervals T, and where T is less than Trecipe, thereby providing substantially smooth ramping of the value of the process parameters over the duration of Trecipe. Further, the controller is configured to permit the selection of start value, end value, and transition between values for a selected parameter within an individual recipe step.