Lithographic projection apparatus
A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control me...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | CORBEIJ, WILHELMUS MARIA BONNEMA, GERRIT MAARTEN DE LEEUW, RARD WILLEM VAN DER LEI, SIJBE ABRAHAM HARTMAN |
| description | A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminium, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW455746BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW455746BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW455746BB3</originalsourceid><addsrcrecordid>eNrjZFD0ySzJyE8vSizIyExWKCjKz0pNLsnMz1NILChILEosKS3mYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXxIeEmpqbmJmZOTsaEVQAANMclyA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic projection apparatus</title><source>esp@cenet</source><creator>CORBEIJ, WILHELMUS MARIA ; BONNEMA, GERRIT MAARTEN ; DE LEEUW, RARD WILLEM ; VAN DER LEI, SIJBE ABRAHAM HARTMAN</creator><creatorcontrib>CORBEIJ, WILHELMUS MARIA ; BONNEMA, GERRIT MAARTEN ; DE LEEUW, RARD WILLEM ; VAN DER LEI, SIJBE ABRAHAM HARTMAN</creatorcontrib><description>A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminium, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010921&DB=EPODOC&CC=TW&NR=455746B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010921&DB=EPODOC&CC=TW&NR=455746B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CORBEIJ, WILHELMUS MARIA</creatorcontrib><creatorcontrib>BONNEMA, GERRIT MAARTEN</creatorcontrib><creatorcontrib>DE LEEUW, RARD WILLEM</creatorcontrib><creatorcontrib>VAN DER LEI, SIJBE ABRAHAM HARTMAN</creatorcontrib><title>Lithographic projection apparatus</title><description>A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminium, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD0ySzJyE8vSizIyExWKCjKz0pNLsnMz1NILChILEosKS3mYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXxIeEmpqbmJmZOTsaEVQAANMclyA</recordid><startdate>20010921</startdate><enddate>20010921</enddate><creator>CORBEIJ, WILHELMUS MARIA</creator><creator>BONNEMA, GERRIT MAARTEN</creator><creator>DE LEEUW, RARD WILLEM</creator><creator>VAN DER LEI, SIJBE ABRAHAM HARTMAN</creator><scope>EVB</scope></search><sort><creationdate>20010921</creationdate><title>Lithographic projection apparatus</title><author>CORBEIJ, WILHELMUS MARIA ; BONNEMA, GERRIT MAARTEN ; DE LEEUW, RARD WILLEM ; VAN DER LEI, SIJBE ABRAHAM HARTMAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW455746BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2001</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>CORBEIJ, WILHELMUS MARIA</creatorcontrib><creatorcontrib>BONNEMA, GERRIT MAARTEN</creatorcontrib><creatorcontrib>DE LEEUW, RARD WILLEM</creatorcontrib><creatorcontrib>VAN DER LEI, SIJBE ABRAHAM HARTMAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CORBEIJ, WILHELMUS MARIA</au><au>BONNEMA, GERRIT MAARTEN</au><au>DE LEEUW, RARD WILLEM</au><au>VAN DER LEI, SIJBE ABRAHAM HARTMAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic projection apparatus</title><date>2001-09-21</date><risdate>2001</risdate><abstract>A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminium, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_TW455746BB |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Lithographic projection apparatus |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T22%3A30%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CORBEIJ,%20WILHELMUS%20MARIA&rft.date=2001-09-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW455746BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |