Lithographic projection apparatus

A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control me...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	CORBEIJ, WILHELMUS MARIA, BONNEMA, GERRIT MAARTEN, DE LEEUW, RARD WILLEM, VAN DER LEI, SIJBE ABRAHAM HARTMAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan, Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminium, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.