Equipment to deposit thin layers on a substrate

The equipment to deposit thin layers on a substrate (8) includes: a current-source (14), which is connected with a cathode (7), with is arranged in a vacuum-chamber (5), and cooperated with a target (6); a process-gas-source (16), which is connected with said vacuum-chamber (5), wherein between said...

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Bibliographische Detailangaben
Hauptverfasser:	TESCHNER, GOTZ, BRUCH, JURGEN, SZCZYRBOWSKI, JOACHIM DR
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The equipment to deposit thin layers on a substrate (8) includes: a current-source (14), which is connected with a cathode (7), with is arranged in a vacuum-chamber (5), and cooperated with a target (6); a process-gas-source (16), which is connected with said vacuum-chamber (5), wherein between said vacuum-chamber (5) and process-gas-source (16) is inserted a distribution-valve (12) which is controlled by a regulator; at least one vacuum-pump (4), whose side is connected with said vacuum-chamber (5), it is characterized by a measuringsensor (3), particularly a potential-metrical measuring- electrode, which compares the component of the gas in said vacuum-chamber (5) or in a supply- line (17), which is connected with said vacuum-chamber (5), through a reference-electrode with a reference-gas or a solid which replaces said reference-electrode, and then leads the obtained signal on the measured potential difference to a regulating-unit (14) which includes a singal-amplifier, said regulating-unit (14) can at its side control the generator of said current-source.