Illuminating system for vacuum ultraviolet microlithography

An illuminating system for the vacuum ultraviolet (VUV) microlithogrpaphy (157 mm) is disclosed and has a VUV light source (1) refractive optical elements of fluoride, at least one microlens array (3, 5) functioning as an element for increasing the light conductance value, and at least one honeycomb...

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Bibliographische Detailangaben
1. Verfasser:	WANGLER, JOHANNES
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An illuminating system for the vacuum ultraviolet (VUV) microlithogrpaphy (157 mm) is disclosed and has a VUV light source (1) refractive optical elements of fluoride, at least one microlens array (3, 5) functioning as an element for increasing the light conductance value, and at least one honeycomb condenser (7a, 7b). The honeycomb condenser is preferably configured of crossed cylinder lens arrays.