A chemical resistant composition and its use
The invention provides a chemical resistant composition comprising at least the following: (a) 100 parts by weight of a hydrogenated (poly) butadiene block copolymer BDB or (B1E)nX, wherein each of the blocks B and B1 comprises a substantially linear, substantially pure polyethylene block, having a...
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| creator | NICOLAAS MARKS HANS FERDINAND VERMEIRE |
| description | The invention provides a chemical resistant composition comprising at least the following: (a) 100 parts by weight of a hydrogenated (poly) butadiene block copolymer BDB or (B1E)nX, wherein each of the blocks B and B1 comprises a substantially linear, substantially pure polyethylene block, having a number of average molecular weight (Mn) in the range of from 5,000 to 250,000; D and E are substantially linear elastomeric polymer blocks, being substantially free from olefinic unsaturation, and having a number of average molecular weight in the range of from 10,000 to 400,000, the weight distribution (Mw/Mn) of the blocks, B, BDB, B1E is 2; (b) from 20 to 100 parts by weight of a predominantly paraffinic and/or naphethenic extender oil; and (c) from 20 to 200 parts by weight of a homopolymer or copolymer of olefins having from 2 to 20 carbon atoms. |
| format | Patent |
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D and E are substantially linear elastomeric polymer blocks, being substantially free from olefinic unsaturation, and having a number of average molecular weight in the range of from 10,000 to 400,000, the weight distribution (Mw/Mn) of the blocks, B, BDB, B1E is <2, and wherein X is a coupling agent residue and n is an integer > 2; (b) from 20 to 100 parts by weight of a predominantly paraffinic and/or naphethenic extender oil; and (c) from 20 to 200 parts by weight of a homopolymer or copolymer of olefins having from 2 to 20 carbon atoms.</description><language>chi ; eng</language><subject>CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980801&DB=EPODOC&CC=TW&NR=337532B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980801&DB=EPODOC&CC=TW&NR=337532B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NICOLAAS MARKS</creatorcontrib><creatorcontrib>HANS FERDINAND VERMEIRE</creatorcontrib><title>A chemical resistant composition and its use</title><description>The invention provides a chemical resistant composition comprising at least the following: (a) 100 parts by weight of a hydrogenated (poly) butadiene block copolymer BDB or (B1E)nX, wherein each of the blocks B and B1 comprises a substantially linear, substantially pure polyethylene block, having a number of average molecular weight (Mn) in the range of from 5,000 to 250,000; D and E are substantially linear elastomeric polymer blocks, being substantially free from olefinic unsaturation, and having a number of average molecular weight in the range of from 10,000 to 400,000, the weight distribution (Mw/Mn) of the blocks, B, BDB, B1E is <2, and wherein X is a coupling agent residue and n is an integer > 2; (b) from 20 to 100 parts by weight of a predominantly paraffinic and/or naphethenic extender oil; and (c) from 20 to 200 parts by weight of a homopolymer or copolymer of olefins having from 2 to 20 carbon atoms.</description><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBxVEjOSM3NTE7MUShKLc4sLknMK1FIzs8tyC_OLMnMz1NIzEtRyCwpVigtTuVhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfEh4cbG5qbGRk5OxoRVAADtvSkv</recordid><startdate>19980801</startdate><enddate>19980801</enddate><creator>NICOLAAS MARKS</creator><creator>HANS FERDINAND VERMEIRE</creator><scope>EVB</scope></search><sort><creationdate>19980801</creationdate><title>A chemical resistant composition and its use</title><author>NICOLAAS MARKS ; HANS FERDINAND VERMEIRE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW337532BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>1998</creationdate><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>NICOLAAS MARKS</creatorcontrib><creatorcontrib>HANS FERDINAND VERMEIRE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NICOLAAS MARKS</au><au>HANS FERDINAND VERMEIRE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A chemical resistant composition and its use</title><date>1998-08-01</date><risdate>1998</risdate><abstract>The invention provides a chemical resistant composition comprising at least the following: (a) 100 parts by weight of a hydrogenated (poly) butadiene block copolymer BDB or (B1E)nX, wherein each of the blocks B and B1 comprises a substantially linear, substantially pure polyethylene block, having a number of average molecular weight (Mn) in the range of from 5,000 to 250,000; D and E are substantially linear elastomeric polymer blocks, being substantially free from olefinic unsaturation, and having a number of average molecular weight in the range of from 10,000 to 400,000, the weight distribution (Mw/Mn) of the blocks, B, BDB, B1E is <2, and wherein X is a coupling agent residue and n is an integer > 2; (b) from 20 to 100 parts by weight of a predominantly paraffinic and/or naphethenic extender oil; and (c) from 20 to 200 parts by weight of a homopolymer or copolymer of olefins having from 2 to 20 carbon atoms.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
| title | A chemical resistant composition and its use |
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