A chemical resistant composition and its use

The invention provides a chemical resistant composition comprising at least the following: (a) 100 parts by weight of a hydrogenated (poly) butadiene block copolymer BDB or (B1E)nX, wherein each of the blocks B and B1 comprises a substantially linear, substantially pure polyethylene block, having a...

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Bibliographische Detailangaben
Hauptverfasser:	NICOLAAS MARKS, HANS FERDINAND VERMEIRE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	The invention provides a chemical resistant composition comprising at least the following: (a) 100 parts by weight of a hydrogenated (poly) butadiene block copolymer BDB or (B1E)nX, wherein each of the blocks B and B1 comprises a substantially linear, substantially pure polyethylene block, having a number of average molecular weight (Mn) in the range of from 5,000 to 250,000; D and E are substantially linear elastomeric polymer blocks, being substantially free from olefinic unsaturation, and having a number of average molecular weight in the range of from 10,000 to 400,000, the weight distribution (Mw/Mn) of the blocks, B, BDB, B1E is 2; (b) from 20 to 100 parts by weight of a predominantly paraffinic and/or naphethenic extender oil; and (c) from 20 to 200 parts by weight of a homopolymer or copolymer of olefins having from 2 to 20 carbon atoms.