Sputtering target and method for producing same

The purpose of the present invention is to provide a sputtering target having high composition uniformity. This sputtering target is formed from a noble metal alloy. The noble metal alloy is formed from 5 or more species of noble metal elements. In an X-ray diffraction spectrum, the number of peaks...

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Bibliographische Detailangaben
Hauptverfasser:	NAKAZAWA, TATSUYA, MAETO, KEISUKE, MIYAMOTO, HIROSHI, OGAWA, KOHEI, KONDO, YOSHIE, KIMURA, SAORI, TAKEHARA, MASAHIKO, HOSOI, TAKUYA, HORIKAWA, TOMU, YAMADA, TAKASHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a sputtering target having high composition uniformity. This sputtering target is formed from a noble metal alloy. The noble metal alloy is formed from 5 or more species of noble metal elements. In an X-ray diffraction spectrum, the number of peaks observed within a range of the diffraction angle 2[Theta] between 38 DEG and 44 DEG is 1.