Charged particle assessment method and system

Charged particle assessment method and system

A charged particle assessment method for identifying candidate defects in samples by scanning a charged particle beam across a sample; the method comprising: obtaining a first reference image from a first region of the sample and a second reference image from a second region of the sample using a ch...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: DAVE, DHARA, KUIPER, VINCENT SYLVESTER
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CALCULATING
COMPUTING
COUNTING
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A charged particle assessment method for identifying candidate defects in samples by scanning a charged particle beam across a sample; the method comprising: obtaining a first reference image from a first region of the sample and a second reference image from a second region of the sample using a charged particle assessment apparatus; obtaining a sample image from a third region of the sample using the charged particle assessment apparatus; and comparing the sample image to the first reference image and to the second reference image to identify any candidate defects in the third region; wherein the first reference image and/or the second reference image are obtained with a higher fidelity than the sample image.