Production control method for a projection exposure apparatus, projection exposure apparatus, and projection exposure method

The invention relates to an assembly for a microlithographic projection exposure apparatus, comprising a sensor frame (101, 201, 301, 401), on which sensors (102, 202, 302, 402) are arranged for the purpose of measuring the position of optical components of the projection exposure apparatus, and a c...

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Bibliographische Detailangaben
1. Verfasser:	LEUERMANN, MARTIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to an assembly for a microlithographic projection exposure apparatus, comprising a sensor frame (101, 201, 301, 401), on which sensors (102, 202, 302, 402) are arranged for the purpose of measuring the position of optical components of the projection exposure apparatus, and a cooling arrangement fastened to the sensor frame (101, 201, 301, 401) and comprising at least one cooling plate (104, 204, 304, 404) which permits the flow of a cooling fluid therethrough.