Pedestal with spiral vanes
This disclosure pertains to pedestal assemblies for supporting wafers in semiconductor manufacturing tools and chambers. Such pedestal assemblies may have a pedestal base that is configured with an internal plenum volume having a plurality of vanes distributed throughout along various spiral referen...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | This disclosure pertains to pedestal assemblies for supporting wafers in semiconductor manufacturing tools and chambers. Such pedestal assemblies may have a pedestal base that is configured with an internal plenum volume having a plurality of vanes distributed throughout along various spiral reference paths. Such pedestal bases may provide enhanced and more uniform cooling. |
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