Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

The present invention provides a substrate processing apparatus. The substrate processing apparatus for processing a substrate may comprise: a chamber which has a processing space; a chuck which supports a substrate in the chamber; a plasma unit which generates plasma to be transferred to the substr...

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Hauptverfasser: KIM, A-RAM, CHO, HEE-JUNE, SHIN, DONG-WHEE, OH, BYOUNG-WOOK, SON, JINUL, JEONG, MIN-JAE
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator KIM, A-RAM
CHO, HEE-JUNE
SHIN, DONG-WHEE
OH, BYOUNG-WOOK
SON, JINUL
JEONG, MIN-JAE
description The present invention provides a substrate processing apparatus. The substrate processing apparatus for processing a substrate may comprise: a chamber which has a processing space; a chuck which supports a substrate in the chamber; a plasma unit which generates plasma to be transferred to the substrate; and an impedance tuning unit which is connected to the chuck, wherein the impedance tuning unit comprises: an inductor; a capacitor; and at least one switch which connects the inductor selectively in series or in parallel to the capacitor.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202435263A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202435263A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202435263A3</originalsourceid><addsrcrecordid>eNrjZLALLk0qLilKLElVKCjKT04tLs7MS1dILChIBIqVFisk5qUoFGNTkptakpGfwsPAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4kPCjQyMTIxNjcyMHY2JUQMA0m0xqA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate processing apparatus and substrate processing method</title><source>esp@cenet</source><creator>KIM, A-RAM ; CHO, HEE-JUNE ; SHIN, DONG-WHEE ; OH, BYOUNG-WOOK ; SON, JINUL ; JEONG, MIN-JAE</creator><creatorcontrib>KIM, A-RAM ; CHO, HEE-JUNE ; SHIN, DONG-WHEE ; OH, BYOUNG-WOOK ; SON, JINUL ; JEONG, MIN-JAE</creatorcontrib><description>The present invention provides a substrate processing apparatus. The substrate processing apparatus for processing a substrate may comprise: a chamber which has a processing space; a chuck which supports a substrate in the chamber; a plasma unit which generates plasma to be transferred to the substrate; and an impedance tuning unit which is connected to the chuck, wherein the impedance tuning unit comprises: an inductor; a capacitor; and at least one switch which connects the inductor selectively in series or in parallel to the capacitor.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240901&amp;DB=EPODOC&amp;CC=TW&amp;NR=202435263A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240901&amp;DB=EPODOC&amp;CC=TW&amp;NR=202435263A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, A-RAM</creatorcontrib><creatorcontrib>CHO, HEE-JUNE</creatorcontrib><creatorcontrib>SHIN, DONG-WHEE</creatorcontrib><creatorcontrib>OH, BYOUNG-WOOK</creatorcontrib><creatorcontrib>SON, JINUL</creatorcontrib><creatorcontrib>JEONG, MIN-JAE</creatorcontrib><title>Substrate processing apparatus and substrate processing method</title><description>The present invention provides a substrate processing apparatus. The substrate processing apparatus for processing a substrate may comprise: a chamber which has a processing space; a chuck which supports a substrate in the chamber; a plasma unit which generates plasma to be transferred to the substrate; and an impedance tuning unit which is connected to the chuck, wherein the impedance tuning unit comprises: an inductor; a capacitor; and at least one switch which connects the inductor selectively in series or in parallel to the capacitor.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLALLk0qLilKLElVKCjKT04tLs7MS1dILChIBIqVFisk5qUoFGNTkptakpGfwsPAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4kPCjQyMTIxNjcyMHY2JUQMA0m0xqA</recordid><startdate>20240901</startdate><enddate>20240901</enddate><creator>KIM, A-RAM</creator><creator>CHO, HEE-JUNE</creator><creator>SHIN, DONG-WHEE</creator><creator>OH, BYOUNG-WOOK</creator><creator>SON, JINUL</creator><creator>JEONG, MIN-JAE</creator><scope>EVB</scope></search><sort><creationdate>20240901</creationdate><title>Substrate processing apparatus and substrate processing method</title><author>KIM, A-RAM ; CHO, HEE-JUNE ; SHIN, DONG-WHEE ; OH, BYOUNG-WOOK ; SON, JINUL ; JEONG, MIN-JAE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202435263A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, A-RAM</creatorcontrib><creatorcontrib>CHO, HEE-JUNE</creatorcontrib><creatorcontrib>SHIN, DONG-WHEE</creatorcontrib><creatorcontrib>OH, BYOUNG-WOOK</creatorcontrib><creatorcontrib>SON, JINUL</creatorcontrib><creatorcontrib>JEONG, MIN-JAE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, A-RAM</au><au>CHO, HEE-JUNE</au><au>SHIN, DONG-WHEE</au><au>OH, BYOUNG-WOOK</au><au>SON, JINUL</au><au>JEONG, MIN-JAE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate processing apparatus and substrate processing method</title><date>2024-09-01</date><risdate>2024</risdate><abstract>The present invention provides a substrate processing apparatus. The substrate processing apparatus for processing a substrate may comprise: a chamber which has a processing space; a chuck which supports a substrate in the chamber; a plasma unit which generates plasma to be transferred to the substrate; and an impedance tuning unit which is connected to the chuck, wherein the impedance tuning unit comprises: an inductor; a capacitor; and at least one switch which connects the inductor selectively in series or in parallel to the capacitor.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Substrate processing apparatus and substrate processing method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T21%3A25%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KIM,%20A-RAM&rft.date=2024-09-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202435263A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true