Substrate hydrophobic treatment method

The present invention provides a substrate hydrophobic treatment method, including following steps: using an atmospheric plasma to carry out a pattern treatment on a substrate surface to form a processed area underwent an atmospheric plasma treatment and a primal area without undergoing the atmosphe...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HUANG, CHUNIEH, CHO, YUN-SHAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention provides a substrate hydrophobic treatment method, including following steps: using an atmospheric plasma to carry out a pattern treatment on a substrate surface to form a processed area underwent an atmospheric plasma treatment and a primal area without undergoing the atmospheric plasma treatment on the substrate surface; and using a physical vapor deposition method to form a hydrophobic layer on the substrate, wherein the hydrophobic layer covers the processed area and the primal area. Through the pattern treatment on the substrate surface by use of plasma, the present invention improves the binding capability of the hydrophobic layer and the substrate, and increases the hydrophobic effect of the hydrophobic layer.