Mixed energy control in an EUV lithography system

A system for and method of controlling extreme ultraviolet (EUV) output power in an EUV radiation source in which one control loop controls at least one system variable impacting the power of a drive laser while the drive laser generates laser pulses converting a portion of target material in an irr...

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Bibliographische Detailangaben
Hauptverfasser:	JACQUES, ROBERT N, MASIC, MILENKO, PARK, JISANG, WANG, YAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	A system for and method of controlling extreme ultraviolet (EUV) output power in an EUV radiation source in which one control loop controls at least one system variable impacting the power of a drive laser while the drive laser generates laser pulses converting a portion of target material in an irradiation region and another control loop controls a hit/miss firing pattern which determines which laser pulses will strike a portion of target material in the irradiation region and which will not.