Substrate processing device and article manufacturing method wherein the substrate processing device includes an airtight container, a depressurization mechanism, a substrate holding part, and a wall member

The invention provides a substrate processing device and a method for manufacturing articles, which reduces the uneven drying speed of a solution applied to a substrate. The substrate processing device includes: an airtight container; a depressurization mechanism for reducing pressure inside the airtight container; a substrate holding part that is arranged inside the airtight container and can hold the substrate; and a wall member arranged inside the airtight container at a position facing a side surface of the substrate held by the substrate holding part. The wall member has a wall surface facing the side surface of the substrate. The wall member has a first liquid-repellent component on at least a portion of the wall surface.