Computer implemented method for defect recognition in an imaging dataset of a wafer, corresponding computer readable-medium, computer program product and systems making use of such methods

The invention relates to a computer implemented method for defect recognition in an imaging dataset of a wafer in a charged particle beam system (78) comprising an embedded system (50), the method comprising: (i) obtaining an imaging dataset of a wafer; (ii) obtaining model data (44, 44', 44�...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SRIKANTHA, ABHILASH, KORB, THOMAS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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