Computer implemented method for defect recognition in an imaging dataset of a wafer, corresponding computer readable-medium, computer program product and systems making use of such methods

The invention relates to a computer implemented method for defect recognition in an imaging dataset of a wafer in a charged particle beam system (78) comprising an embedded system (50), the method comprising: (i) obtaining an imaging dataset of a wafer; (ii) obtaining model data (44, 44', 44�...

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Hauptverfasser: SRIKANTHA, ABHILASH, KORB, THOMAS
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to a computer implemented method for defect recognition in an imaging dataset of a wafer in a charged particle beam system (78) comprising an embedded system (50), the method comprising: (i) obtaining an imaging dataset of a wafer; (ii) obtaining model data (44, 44', 44'') for a model architecture (42) of a machine learning model (40, 40', 40'') for defect recognition in the imaging dataset of the wafer, the model architecture (42) being implemented in the embedded system (50); (iii) transferring the model data (44, 44', 44'') to a programmable memory (48, 48', 48'') of the embedded system (50); (iv) applying the machine learning model (40, 40', 40'') to an imaging dataset of a wafer to recognize defects, comprising executing the embedded system implemented model architecture (46) with the transferred model data (44, 44', 44'').