Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

There is provided a technique capable of improving the uniformity of heating the substrate in the heat treatment process using the electromagnetic wave. The technique includes a process chamber in which a substrate is processed; an electromagnetic wave source configured to output a first electromagn...

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Bibliographische Detailangaben
Hauptverfasser: NABETA, KAZUYA, YAMAMOTO, KATSUHIKO, TAKEBAYASHI, MOTONARI, SAKANO, ATSUYA
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:There is provided a technique capable of improving the uniformity of heating the substrate in the heat treatment process using the electromagnetic wave. The technique includes a process chamber in which a substrate is processed; an electromagnetic wave source configured to output a first electromagnetic wave and a second electromagnetic wave at least partially at the same time to the process chamber; and a frequency controller configured to be capable of controlling at least one of a frequency of the first electromagnetic wave or a frequency of the second electromagnetic wave.