Dome shaped chamber for generating in-situ cleaning plasma

A processing chamber includes a first portion, including a dome, and a second portion. The dome includes a ceramic material and is elliptical in shape. A pedestal to process a substrate is arranged in the second portion. A showerhead is arranged at a base of the dome between the first and second portions. An injector including the ceramic material is mounted on the dome to inject a process gas and a cleaning gas into the dome during substrate processing and cleaning of the processing chamber, respectively. A coil is disposed around a portion of the dome. An RF generator supplies RF power to the coil to generate plasma in the dome during the substrate processing and the cleaning. A controller controls temperatures of the pedestal and the showerhead at respective predetermined temperatures within a predetermined range during the substrate processing and the cleaning.