Substrate support qualification

Disclosed herein is a stand-alone qualification system for determining at least one operating characteristic of a fluid extraction system of a substrate support, the qualification system comprising: an extraction support system configured to support a two-phase fluid extraction by the fluid extracti...

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Bibliographische Detailangaben
Hauptverfasser:	BERENDSEN, CHRISTIANUS WILHELMUS JOHANNES, VAN OENE, MAARTEN MARINUS, AMMERLAAN, JOHANNES ANDREAS MARIA, GATTOBIGIO, GIOVANNI LUCA, ROPS, CORNELIUS MARIA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL METERING BY VOLUME ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Disclosed herein is a stand-alone qualification system for determining at least one operating characteristic of a fluid extraction system of a substrate support, the qualification system comprising: an extraction support system configured to support a two-phase fluid extraction by the fluid extraction system; and a measurement system configured to determine at least one operating characteristic of the fluid extraction system in dependence on the two-phase fluid extraction.